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Chemical Structure| 1793-07-3 Chemical Structure| 1793-07-3

Structure of 1793-07-3

Chemical Structure| 1793-07-3

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Product Details of [ 1793-07-3 ]

CAS No. :1793-07-3
Formula : C9H7NO3
M.W : 177.16
SMILES Code : O=C(C1=CC=CC=C1N=C=O)OC
MDL No. :MFCD00013848

Safety of [ 1793-07-3 ]

GHS Pictogram:
Signal Word:Danger
Hazard Statements:H334-H302+H312+H332
Precautionary Statements:P260-P271-P280-P260-P271-P280
Class:6.1
UN#:2206
Packing Group:

Application In Synthesis of [ 1793-07-3 ]

* All experimental methods are cited from the reference, please refer to the original source for details. We do not guarantee the accuracy of the content in the reference.

  • Downstream synthetic route of [ 1793-07-3 ]

[ 1793-07-3 ] Synthesis Path-Downstream   1~1

  • 1
  • [ 1793-07-3 ]
  • [ 95753-55-2 ]
  • [ 4659-45-4 ]
  • [ 74-88-4 ]
  • [ 401901-92-6 ]
YieldReaction ConditionsOperation in experiment
Fmoc-Phe(4-nitro)-OH (2.5g), 2,6-dichlorobenzoyl chloride (0.745mL) and pyridine (1.5mL) in a solution of NMP (25mL) were added to Wang resin (0.76mmol/g, 2.3g) and stirred at room temperature for 16 hours. After removing the excess solvent, the resin was washed with DMF three times, dichloromethane three times and NMP twice. In order to conduct capping of an unreacted hydroxyl group on the resin, the resin was treated with acetic anhydride (20mL), pyridine (20mL) and NMP (20mL) for 2 hours. After removing the excess solvent, the resin was washed with DMF three times and dichloromethane three times, and dried under reduced pressure.Process 2 Removal of Fmoc group A DMF solution of 20% piperidine (25mL) was added to the resin obtained in Process 1 and reacted for 15 minutes. After removing the solvent, the resin was washed with DMF and dichloromethane three times each, and dried under reduced pressure.Process 3 Acylation reaction 2,6-dichlorobenzoyl chloride (1.1mL), 2,6-lutidine (1.6mL) and NMP (26mL) were added to 2.0g of the resin obtained in Process 2 and reacted for 6 hours. After removing the excess solvent, the resin was washed with DMF and dichloromethane three times each, and dried under reduced pressure.Process 4 Reduction of nitro group NMP (30mL) · EtOH (1.5mL) solution of SnCl2· 2H2O (15.0g) was added to 1.5g of the resin obtained in Process 3 and reacted for 16 hours. After removing the reaction solvent, the resin was washed with DMF and dichloromethane three times each.Process 5 Construction of quinazoline-2,4-dione ring 2g of the resin obtained in Process 4 was reacted in NMP solution (32mL) of methyl 2-isocyanatebenzoate (1.92g) for 16 hours. After removing the reaction solvent, the resin was washed with DMF and dichloromethane three times each. DMF solution of 20% piperidine was added to the resin for 1 hour. After removing the reaction solvent, the resin was washed with DMF and dichloromethane three times each and dried under reduced pressure.Process 6 Alkylation Methyl iodide (0.75mmol), 18-crown-6 (30mg), NMP (1mL) and K2CO3 (35mg) were added to 20mg of the resin obtained in Process 5 and reacted for 3 days. After removing the reaction solvent, the resin was washed with DMF, water, DMF and dichloromethane three times each and dried under reduced pressure.Process 7 Cleavage from resin The resin obtained in Process 6 was treated with trifluoroacetic acid containing 5% of water for 1 hour. After filtration, the filtrate was concentrated under reduced pressure. The residue was purified with high-pressure liquid chromatography (water/acetonitrile) to obtain 8mg of the intended compound. MS(ESI MH+) : 512 CHNO : C25H19Cl2N3O5
 

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